Ready to Compete on the Runway
Ever since she was little, playing dress-up with her cousins, Isabel Hajian 19 AP has known that she wants to design clothing for a living. Now the new Apparel Design grad is working overtime prior to three high-profile runway shows: two in New York and one in Paris.
As one of eight finalists in this year’s Supima Design Competition—the leading cotton company’s wonderful opportunity for emerging talent—she has been working nonstop this summer in RISD’s Apparel Design studio. The designer is now finalizing five dazzling eveningwear looks that showcase Supima denim, jersey, twill, shirting and velveteen for the September 5 competition show during New York Fashion Week.
“Isabel’s work is captivating,” says longtime Apparel Design faculty member Meg DeCubellis 83 AP, who also serves as the department’s Supima competition mentor. “The way she manipulates fabric and mixes colors to create sculptural pieces is truly unique."
Photo by Jo Sittenfeld MFA 08 PH
